Efficient ILT via Multigrid-Schwartz Method
Shuyuan Sun, Fan Yang, Bei Yu, Li Shang, Dian Zhou, Xuan Zeng
摘要
Inverse Lithography Technology (ILT) is an important Resolution Enhancement Technology (RET) in chip manufacturing. Due to the high computational demands of ILT, large-scale layouts are typically partitioned into smaller tiles for independent processing. In this paper, we propose a multigrid-Schwarz method to overcome challenges in tile assembly. Experimental results show that our approach achieves comparable performance to the full-chip ILT, offering increased parallelizability and speedup in parallel mode. Unlike the traditional divide-and-conquer algorithm, it effectively alleviates discontinuities of tile stitching, preventing manufacturing failures.
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