GlyphMastero: A Glyph Encoder for High-Fidelity Scene Text Editing
Tong Wang, Ting Liu, Xiaochao Qu, Chengjing Wu, Luoqi Liu, Xiaolin Hu
摘要
Scene text editing, a subfield of image editing, requires modifying texts in images while preserving style consistency and visual coherence with the surrounding environment. While diffusion-based methods have shown promise in text generation, they still struggle to produce high-quality results. These methods often generate distorted or unrecognizable characters, particularly when dealing with complex characters like Chinese. In such systems, characters are composed of intricate stroke patterns and spatial relationships that must be precisely maintained. We present Glyph-Mastero, a specialized glyph encoder designed to guide the latent diffusion model for generating texts with strokelevel precision. Our key insight is that existing methods, despite using pretrained OCR models for feature extraction, fail to capture the hierarchical nature of text structures -from individual strokes to stroke-level interactions to overall character-level structure. To address this, our glyph encoder explicitly models and captures the cross-level interactions between local-level individual characters and global-level text lines through our novel glyph attention module. Meanwhile, our model implements a feature pyramid network to fuse the multi-scale OCR backbone features at the global-level. Through these cross-level and multiscale fusions, we obtain more detailed glyph-aware guidance, enabling precise control over the scene text generation process. Our method achieves an 18.02% improvement in sentence accuracy over the state-of-the-art multi-lingual scene text editing baseline, while simultaneously reducing the text-region Fréchet inception distance by 53.28%.
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引用它的顶会 Paper3
- StyleTextGen: Style-Conditioned Multilingual Scene Text GenerationZeyu Chen, Fangmin Zhao, Yan Shu, Yichao Liu 等CVPR 2026 · 被引用 4 次
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- Towards Training-free Scene Text EditingYubo Li, Xugong Qin, Peng Zhang, Hailun Lin 等CVPR 2026
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