Explaining Image Classifiers with Multiscale Directional Image Representation
Stefan Kolek, Robert Windesheim, Héctor Andrade-Loarca, Gitta Kutyniok, Ron Levie
Abstract
Image classifiers are known to be difficult to interpret and therefore require explanation methods to understand their decisions. We present ShearletX, a novel mask explanation method for image classifiers based on the shearlet transform -a multiscale directional image representation. Current mask explanation methods are regularized by smoothness constraints that protect against undesirable fine-grained explanation artifacts. However, the smoothness of a mask limits its ability to separate fine-detail patterns, that are relevant for the classifier, from nearby nuisance patterns, that do not affect the classifier. ShearletX solves this problem by avoiding smoothness regularization all together, replacing it by shearlet sparsity constraints. The resulting explanations consist of a few edges, textures, and smooth parts of the original image, that are the most relevant for the decision of the classifier. To support our method, we propose a mathematical definition for explanation artifacts and an information theoretic score to evaluate the quality of mask explanations. We demonstrate the superiority of ShearletX over previous mask based explanation methods using these new metrics, and present exemplary situations where separating fine-detail patterns allows explaining phenomena that were not explainable before.
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Cited by top-tier papers5
- Finding NEM-U: Explaining unsupervised representation learning through neural network generated explanation masksBjørn Leth Møller, Christian Igel, Kristoffer Knutsen Wickstrøm, Jon Sporring et al.ICML 2024 · 3 citations
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- One Wave To Explain Them All: A Unifying Perspective On Feature AttributionGabriel Kasmi, Amandine Brunetto, Thomas Fel, Jayneel ParekhICML 2025
- Hidden Monotonicity: Explaining Deep Neural Networks via their DC DecompositionJakob Paul Zimmermann, Georg LohoCVPR 2026
- Start Smart: Leveraging Gradients For Enhancing Mask-based XAI MethodsBuelent Uendes, Shujian Yu, Mark HoogendoornICLR 2025
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