CVPR2024

BA-SAM: Scalable Bias-Mode Attention Mask for Segment Anything Model

Yiran Song, Qianyu Zhou, Xiangtai Li, Deng-Ping Fan, Xuequan Lu, Lizhuang Ma

19 citations

Abstract

In this paper, we address the challenge of image resolution variation for the Segment Anything Model (SAM). SAM, known for its zero-shot generalizability, exhibits a performance degradation when faced with datasets with varying image sizes. Previous approaches tend to resize the image to a fixed size or adopt structure modifications, hindering the preservation of SAM's rich prior knowledge. Besides, such task-specific tuning necessitates a complete retraining of the model, which is cost-expensive and unacceptable for deployment in the downstream tasks. In this paper, we reformulate this challenge as a length extrapolation problem, where token sequence length varies while maintaining a consistent patch size for images with different sizes. To this end, we propose a Scalable Bias-Mode Attention Mask (BA-SAM) to enhance SAM's adaptability to varying image resolutions while eliminating the need for structure modifications. Firstly, we introduce a new scaling factor to ensure consistent magnitude in the attention layer's dot product values when the token sequence length changes. Secondly, we present a bias-mode attention mask that allows each token to prioritize neighboring information, mitigating the impact of untrained distant information. Our BA-SAM demonstrates efficacy in two scenarios: zero-shot and finetuning. Extensive evaluation of diverse datasets, including DIS5K, DUTS, ISIC, COD10K, and COCO, reveals its ability to significantly mitigate performance degradation in the zero-shot setting and achieve state-of-the-art performance with minimal fine-tuning. Furthermore, we propose a generalized model and benchmark, showcasing BA-SAM's generalizability across all four datasets simultaneously.